SEMATECH Reaches Milestone in Defect Cleaning for EUV Mask Blanks (Views:631, Saved 4 Time(s)) Albany, NY (11 April 2007) – Technologists at SEMATECH have successfully detected and cleaned 10 nm particles from mask blanks for use in extreme ultraviolet (EUV) lithography – pushing the technology another significant step toward readiness ...
SEMATECH to Demonstrate EUV Leadership, Technical Breakthroughs at SPIE (Views:632, Saved 0 Time(s)) Austin, TX (21 February 2007) – A comprehensive overview of SEMATECH’s world-leading extreme ultraviolet (EUV) program will highlight a key session in emerging technologies during the SPIE Advanced Lithography conferences next week in San Jose...
ATDF & ACC Seeking Summer Interns for Innovative Nanoscholars Program (Views:7784, Saved 0 Time(s)) Austin, TX (13 February 2007) – ATDF, the nanoelectronics R&D foundry, and the Austin Community College District (ACC) are offering online applications for the summer session of the Nanoelectronic Workforce Development Initiative (NWDI) – ...
ISMI Reveals Cost-Saving Method for Correcting Process Variation in Fab Tools (Views:802, Saved 5 Time(s)) Austin, TX (7 February 2007) — A money-saving methodology that allows fab managers to adjust an errant piece of equipment by matching it to the best-performing tool of its type has been developed by process engineers at International SEMATECH Manufa...
SEMATECH to Continue Pursuing Planar Transistor Scaling Strategy (Views:647, Saved 5 Time(s)) Austin, TX (5 February 2007) — Front-end engineers at SEMATECH will combine planar CMOS approaches with new channel materials to develop effective transistors for the 22 nm half-pitch technology generation – but will continue to investigate Fi...
SEMATECH & TEL Partner in 3D Interconnect & High-Mobility Channel Materials (Views:750, Saved 0 Time(s))
Austin, TX (25 January 2007) — SEMATECH and Tokyo Electron Limited (TEL) have launched a multi-year joint development program aimed at improving the prospects for using 3D interconnect technology and high mobility channel materials ...
4th ISMI Symposium Set Oct. 24-25 in Austin; Focus is “Productivity in Depth” (Views:661, Saved 0 Time(s))
Austin, TX (23 January 2007)—The 4th ISMI Symposium on Manufacturing Effectiveness, a results-driven gathering of the world’s top microchip makers and their suppliers, will be held Oct. 24-25 in Austin with a theme of &n...
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