Tokyo Electron to Launch CLEAN TRACK™ LITHIUS Pro™ Z to Support Advanced Scaling

東京エレクトロン株式会社（東京都港区、社長：竹中博司）は、300mmプロセス対応の塗布現像装置CLEAN TRACK™ LITHIUS™シリーズの最新機種として、さらなる微細化プロセスに対応する高生産性モデルCLEAN TRACK™ LITHIUS Pro™ Zを2012年秋に市場に投入します。

CLEAN TRACK LITHIUS Pro Zは、2009年にリリースし、多くのお客様から支持していただいているCLEAN TRACK LITHIUS Pro Vの基本コンセプトを発展させ、さらなる高スループット化とともに、今後の微細化に伴うディフェクト低減への機能を付加します。さらに、 OEE（Overall Equipment Efficiency）改善およびランニングコストの低減コンセプトも継続し、お客様の製品の生産性向上に貢献します。

また、EUVプロセス技術などへのプロセス拡張性も備え、最先端半導体工場における、効率的な半導体デバイス生産環境の構築を強力にサポートいたします。

Tokyo Electron Limited (TEL) announced today that, in the fall of 2012, the company will release the CLEAN TRACK™ LITHIUS Pro™ Z, the latest model of the 300mm CLEAN TRACK™ LITHIUS™ coater/developer series, to enable the advanced scaling necessary for next generation devices.

The CLEAN TRACK LITHIUS Pro Z expands on the core concept of the CLEAN TRACK LITHIUS Pro V by offering even greater throughput and improved defect control to achieve customers’ future scaling requirements. It also features improved OEE (Overall Equipment Efficiency) and reduced running costs, contributing to enhanced productivity.

“Our development focus for the LITHIUS Pro Z is to control defects to levels necessary for next generation devices”, commented Toshi Nishigaki,Vice President and General Manager of TEL’s Clean Track Business Unit. “With our customers’ increased emphasis on OEE, especially on EUV lithography clusters, our goal is to improve cluster availability by minimizing coater/developer related losses. Additionally, as part of our environmental initiatives, we intend to further reduce the amount of chemicals and utilities used on this platform”.

The CLEAN TRACK LITHIUS Pro Z offers increased process flexibility to support advanced immersion lithography, including double and multiple patterning scenarios and EUV process.