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Complementary Lithography - Stochastics Suppression and EUV, High Tech

Complementary Lithography - Stochastics Suppression and EUV Complementary Lithography - Stochastics Suppression and EUV

Complementary Lithography at Insertion and Beyond - Complementary Lithography - View 2010. Cuts and Vias - Edge Placement Errors and Stochastic Control. Following capabilities have to be present at HVM NGL Insertion to support Yield and COO, Required Defect density/TPT, Required NGL/193i Overlay, Sophisticated OPC, Stochastics Suppression, If not controlled things can get out of hand in a hurry Overlay, OPC, Defects issues are known and pushed, Scope of Stochastic Suppression challenge.

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Author: Yan Borodovsky (Fellow) | Visits: 480 | Page Views: 4398
 
Domain:  High Tech Category: Semiconductors Subcategory: Lithography 
Upload Date: 19th-Sep-2012  Click On Above Link To See More
Reference: SEMICON West

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