EUV mask readiness - Technically, ArF lithography can be extended almost indefinitely. Cost of ownership (CoO) is a different matter, Before EUV CoO can be competitive, three technical issues must be solved source power, mask defectivity, and resist performance, Mask defect management is fundamentally different for EUV than for ArF and requires a new methodology, EUV insertion can occur before the full mask toolkit is in place, but a bridge strategy will be required, and we should expect new iss.
